PRODUCTS

Product category

ALD atomic layer deposition

Category：

Process equipment

Product description

Atomic layer deposition equipment

Model: TLE-AL200S

Parameters:

Reaction chamber: stainless steel reaction chamber, including sample table, height < 50mm

Vacuum system: including oil pump and vacuum gauge (full program gauge)

Gas flow control system: including high-precision imported flowmeter (two-way nitrogen)

Control system: including hardware controller, temperature controller and process control software, one button stop

Operating computer: a notebook computer pre-installed with windows system and process control software

Precursor source transport system: each route is equipped with a set of 50ml steel cylinder, a pneumatic valve and a manual valve

Frame: aluminum frame, painted panel

Others: including sampling fixture and other standard accessories